Method and apparatus for VHF plasma processing with load mismatch reliability and stability

摘要

A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions is provided. The apparatus includes an RF oscillator configured to generate an RF signal, an RF amplifier responsive to the RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load, and a VHF-band circulatorcoupled to the amplifier and configured to isolate nonlinearities of the plasma chamber load from the amplifier.