| 发明名称 |
Polymers, resist compositions and patterning process |
| 摘要 |
A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation below 300 nm, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.
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| 申请公布号 |
US2003215739(A1) |
申请公布日期 |
2003.11.20 |
| 申请号 |
US20030395256 |
申请日期 |
2003.03.25 |
| 申请人 |
HARADA YUJI;HATAKEYAMA JUN;KAWAI YOSHIO;SASAGO MASARU;ENDO MASAYUKI;KISHIMURA SHINJI;MAEDA KAZUHIKO;OOTANI MICHITAKA;KOMORIYA HARUHIKO |
发明人 |
HARADA YUJI;HATAKEYAMA JUN;KAWAI YOSHIO;SASAGO MASARU;ENDO MASAYUKI;KISHIMURA SHINJI;MAEDA KAZUHIKO;OOTANI MICHITAKA;KOMORIYA HARUHIKO |
| 分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/20;G03F7/38;G03F7/40 |
主分类号 |
G03F7/004 |
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