发明名称 METHOD FOR HIGH PURITY PURIFICATION OF HIGH FUNCTIONAL MATERIAL AND METHOD FOR DEPOSITION OF HIGH FUNCTIONAL MATERIAL BY MASS SEPARATION METHOD
摘要 A method for high purity purification, wherein an organic compound, such as dimethyl zinc, or a gaseous element compound, such as oxygen as a starting material is irradiated with an excimer laser (21), dissociated and ionized by the non-resonant multiphoton absorption not passing by way of an intermediate level, and the ionized element is freed of impurities by the mass separation method using the electromagnetic field (55) to thereby deposit a predetermined ionized element alone on a target (61). In an embodiment, elements to be ionized are Zn and, Se or O, and N, Cl or the like is used as a dopant. The method allows the reduction of the load by impurities derived from starting materials and the improvement of ionization efficiency, resulting in the improvement of productivity, in a high purity purification process by the mass separation method for an element such as zinc or selenium.
申请公布号 WO03095700(A1) 申请公布日期 2003.11.20
申请号 WO2003JP05595 申请日期 2003.05.01
申请人 UMK TECHNOLOGIES CO., LTD.;MORI, NOBUYUKI;USHIDA, TAKASHI;KAMIJO, YOSHIMI;NAKAJIMA, KO;OKAZAKI, AKIHIRO;MITSUZUKA, AKIRA;TAKOSHIMA, TAKEHIRO;MIKAMI, NAOHIKO 发明人 MORI, NOBUYUKI;USHIDA, TAKASHI;KAMIJO, YOSHIMI;NAKAJIMA, KO;OKAZAKI, AKIHIRO;MITSUZUKA, AKIRA;TAKOSHIMA, TAKEHIRO;MIKAMI, NAOHIKO
分类号 C23C16/48;C23C14/32;H01J37/08;H01L21/365;(IPC1-7):C23C14/32;C23C16/18;H01J27/24;H01J37/317 主分类号 C23C16/48
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