发明名称 Acid generator and thin film composition containing the same
摘要 The present invention relates to the compounds generating strong acids (described hereafter as "acid generators") decomposed by heat and the composition of thin film containing the same. Provided are the compounds represented by the structure of formula I and the composition containing the compounds. wherein X is alkyl or aryl group and R is hydrogen atom, hydroxy, alkoxy or alkyl group. The abovementioned acid generators of the present invention generate acid by heat at relatively low temperatures, preventing the change in the ratio of the composition due to evaporation of some components in the composition. Accordingly, it has the advantageous effect that the ratio of components in the composition is controlled and the preparation of the thin film with the wanted properties is simplified.
申请公布号 US2003216495(A1) 申请公布日期 2003.11.20
申请号 US20030421490 申请日期 2003.04.22
申请人 KOREA KUMHO PETROCHEMICAL CO., LTD. 发明人 PARK JOO HYEON;LEE JOUNG BUM;KIM SEONG JU
分类号 C08K5/41;C07C303/26;C07C309/65;C07C309/73;C08F216/14;C08F216/34;C08F220/26;C08K5/42;C08L25/02;C08L29/10;C08L29/12;C08L33/06;G03F7/004;G03F7/038;H01L21/027;(IPC1-7):C08L1/00;C0739/71 主分类号 C08K5/41
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