发明名称 VOLATILE COPPER(II) COMPLEXES FOR DEPOSITION OF COPPER FILMS BY ATOMIC LAYER DEPOSITION
摘要 <p>The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process. This invention also provides a process for making amino-imines and novel amino-imines.</p>
申请公布号 WO2003095701(P1) 申请公布日期 2003.11.20
申请号 US2003001846 申请日期 2003.01.21
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