METHOD FOR PRODUCING A UNIT COMPRISING THREE-DIMENSIONAL SURFACE STRUCTURING AND USE OF SAID METHOD

摘要

The invention relates to a method ("lift-off method") for producing a unit (1) comprising three-dimensional surface structuring on a base layer (3). In a first step of the inventive method, a photoresist is applied to the base layer (3) in order to produce a photoresist layer (9). A masked exposure (13) of the photoresist layer (9), adapted to a pre-determined final surface structuring, is carried out in a second step. In a third step, parts of the photoresist layer (9) are removed by development, such that initial surface structuring comprising photoresist partial regions (25) as sacrificial layer regions is obtained. In a fourth step, a coating (29, 31) covering the obtained initial surface structuring is applied, especially sputtered, preferably as an alternating layer system. In a fifth step, energy is supplied to the initial surface structuring in order to destabilise the sacrificial layer regions (25). In a sixth step, a high pressure liquid jet (33) is applied to the initial surface structuring at a pre-determined processing temperature, whereby at least parts of the coating (29) covering the sacrificial layer regions (25) are mechanically removed or at least broken off in order to produce the final surface structuring. In the sixth step, during the application of the high pressure liquid jet at the operating temperature, the liquid of the high pressure liquid jet (33) has a negligible chemical reaction speed and/or physical dissolution speed with materials of the unit (1) and/or with especially organic liquid sealants below a measuring limit. The invention enables the problems of prior art to be overcome. The aim of the invention is especially to provide a method by which means a lift-off technique can be used without necessitating the use of expensive solvents which are difficult to handle.