FABRICATION OF SILICON MICRO MECHANICAL STRUCTURES
摘要
A method for protecting a material of a microstructure comprising said material and a noble metal layer (8) against undesired galvanic etching during manufacture comprises forming on the structure a sacrificial metal layer (12) having a lower redox potential than said material, the sacrificial metal layer (12) being electrically connected to said noble metal layer (8).
申请公布号
WO02057179(A3)
申请公布日期
2003.11.20
申请号
WO2002IB00154
申请日期
2002.01.11
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION;DESPONT, MICHEL;DRECHSLER, UTE;MAGNUSON, ROY, H.