| 摘要 |
PROBLEM TO BE SOLVED: To evenly etch the line width of a spiral type flat coil used for a bias coil type magnetic impedance element. SOLUTION: A magnetic detecting part 12 is formed on a non-magnetic substrate 11 such as a glass substrate which is a switchbacked magnetic thin film with a long and mutually parallel pattern. On the magnetic detecting part 12, a flat spiral coil 14 is formed by etching through an insulating film. With the spiral coil 14 applied with a current, a magnetic field occurring from a coil line across the magnetic detecting part 12 is utilized to apply a bias voltage to the magnetic detecting part 12. At etching with the spiral coil 14, a dummy wiring pattern 16 having the same pitch width as an inner circumference is provided outside an outermost circumference 14a of the spiral coil 14, so that the thickness of a coil line at the outer circumference of the spiral coil 14 is prevented from decreasing. COPYRIGHT: (C)2004,JPO
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