| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photocurable silphenylene composition, and to obtain a cured material of the composition having a low moisture permeable property, a low gas permeability and improved mechanical properties, obtained by giving a photoirradiation to the composition. SOLUTION: The photocurable silphenylene composition contains (A) a silphenylene compound having a (meth)acrylic functional group and represented by of formula (1) (wherein, R<SP>1</SP>, R<SP>2</SP>, R<SP>3</SP>and R<SP>4</SP>are respectively the same or each a different 1-10C univalent hydrocarbon group, R<SP>5</SP>and R<SP>6</SP>are the same or each a different 1-50C univalent organic group and one of which contains at least one acrylic or methacrylic structure) and (B) a photopolymerization initiator. COPYRIGHT: (C)2004,JPO
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