| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To surely prevent a pattern from having a wire breaking part or an overlap part while suppressing an increase in data processing time as to a method for bias processing of a clip-processed exposure mask pattern. <P>SOLUTION: Two vertexes obtained by moving vertexes constituting a division segment for dividing an exposure pattern among vertexes constituting a clip-processed divided pattern are regarded as division points and the coordinates of respective division points are moved toward the division segment in the extension direction of the sides composed of the division points and other vertexes. When the prolongation of the division segment does not overlap with a side of the exposure pattern, the coordinates of the respective division points are returned onto the division segment or prolongation. When the prolongation of the division segment overlaps with a side of the exposure pattern and the value obtained by adding the interval of the division points and a value twice as large as a bias quantity in the division direction together is equal to the length of the division segment, the respective division points are put back by twice as long as the distance up to the division segment or its prolongation. <P>COPYRIGHT: (C)2004,JPO</p> |
