| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a photosensitive polymer having uniformly distributed hydrophilic units and hydrophobic units, and a resist composition containing the same. <P>SOLUTION: The photosensitive polymer comprises a structure represented by formula (1) [wherein, R<SB>1</SB>and R<SB>2</SB>are each independently hydrogen atom or methyl group, R<SB>3</SB>is a 4-20C hydrocarbon group that is decomposable with an acid, R<SB>4</SB>is a hydrophilic group, (a), (b), (c), (d) and (e) represent each the polymerization degree of each repeating unit, provided that a/(a+b+c+d+e) is 0.01-0.6, b/(a+b+c+d+e) is 0.05-0.7, c/(a+b+c+d+e) is 0.01-0.6, d/(a+b+c+ d+e) is 0.1-0.5, and e/(a+b+c+d+e) is 0.01-0.5]. <P>COPYRIGHT: (C)2004,JPO |
