| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat-developable photosensitive material excellent in electrostatic property and improved in problems due to electrification, such as voids due to adhesion of dust before exposure. SOLUTION: The heat-developable photosensitive material comprises a non- photosensitive silver source, a photosensitive silver halide and a reducing agent on at least one side of a support, and when the natural logarithm of surface resistance of the heat-developable photosensitive material in an environment at 25°C and 25% relative humidity is represented by SR(25) and that in an environment at 25°C and 60% relative humidity by SR(60), the heat-developable photosensitive material satisfies both the conditions 0≤SR(25)-SR(60)≤1.0 and 10.0≤SR(25)≤14.0 on at least one side. COPYRIGHT: (C)2004,JPO
|
