发明名称 |
METHOD FOR FORMING FINE CIRCUIT WIRING AND APPARATUS USED FOR THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide means for preventing migration by slowing down and suppressing the movement of the copper atoms themselves from fine copper wiring formed by copper plating. SOLUTION: The method for forming fine circuit wiring comprises forming a first plating layer by plating including the metal diffusible into the copper (provided that alloy plating with the copper is precluded) and a second plating layer by copper plating on a substrate for electronic circuits which is provided with fine circuit patterns and is formed with a barrier layer and a seed layer at need. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2003328184(A) |
申请公布日期 |
2003.11.19 |
申请号 |
JP20020141230 |
申请日期 |
2002.05.16 |
申请人 |
EBARA CORP;EBARA UDYLITE KK |
发明人 |
HONGO AKIHISA;FUKUNAGA AKIRA;NAGAI MIZUKI;KIMIZUKA RYOICHI;KOBAYASHI TAKESHI;SATO TAKURO |
分类号 |
C25D7/12;C25D5/10;C25D7/00;H01L21/288;H01L21/3205;H01L23/52;H05K3/18;(IPC1-7):C25D7/12;H01L21/320 |
主分类号 |
C25D7/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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