发明名称 METHOD FOR FORMING FINE CIRCUIT WIRING AND APPARATUS USED FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To provide means for preventing migration by slowing down and suppressing the movement of the copper atoms themselves from fine copper wiring formed by copper plating. SOLUTION: The method for forming fine circuit wiring comprises forming a first plating layer by plating including the metal diffusible into the copper (provided that alloy plating with the copper is precluded) and a second plating layer by copper plating on a substrate for electronic circuits which is provided with fine circuit patterns and is formed with a barrier layer and a seed layer at need. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003328184(A) 申请公布日期 2003.11.19
申请号 JP20020141230 申请日期 2002.05.16
申请人 EBARA CORP;EBARA UDYLITE KK 发明人 HONGO AKIHISA;FUKUNAGA AKIRA;NAGAI MIZUKI;KIMIZUKA RYOICHI;KOBAYASHI TAKESHI;SATO TAKURO
分类号 C25D7/12;C25D5/10;C25D7/00;H01L21/288;H01L21/3205;H01L23/52;H05K3/18;(IPC1-7):C25D7/12;H01L21/320 主分类号 C25D7/12
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