| 摘要 |
<P>PROBLEM TO BE SOLVED: To directly deposit an inorganic substance represented by a carbon based substance such as graphite and glassy carbon, on the surface of various substrate materials in a simple process, under reduced pressure or pressurization, without particularly heating the substrate, in the region of a micrometer order without using a mask or the like. <P>SOLUTION: This micro-plasma CVD apparatus is composed of cylindrical plasma torch of an insulating material, a plasma gas supply system, a high frequency power source for generating plasma, a matching box, an igniter for turning on plasma, an atmospheric gas blowing nozzle, and a triaxial manipulator for controlling the position of a deposit substrate. For the purpose of depositing a carbon nano tube material, a hydrocarbon gas such as methane is simply mixed in a plasma gas represented by an inert gas such as argon, and is then supplied to a plasma nozzle. This process can be performed under the atmospheric pressure and under conditions of reduced pressure or high pressure. <P>COPYRIGHT: (C)2004,JPO |
