| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for inspecting a photomask which can detect even a minute defect. <P>SOLUTION: A light source emits light with wavelength substantially similar to the light source of a specified exposure device which uses the photomask, the light is guided to an optical system which is substantially similar to the optical system of the exposure device and has the photomask arranged on its optical path, and a light intensity image generation part receives the light guided from the optical system to generate a light intensity image (S14a). A light intensity simulator part, on the other hand, calculates a light intensity simulation image by simulation from mask design data (S14b) and a comparative decision part compares them with each other (S15) to decide whether the photomask has a defect (S16). Or two light intensity images corresponding to two identical light blocking patterns are generated and compared with each other. <P>COPYRIGHT: (C)2004,JPO</p> |
