发明名称 |
Method of manufacturing photomask |
摘要 |
A method of manufacturing a photomask includes determining an average value of dimensions of a pattern in a photomask. determining an in-plane uniformity of the dimensions, determining an exposure latitude on the basis of the average value and the in-plane uniformity. The exposure latitude depends on dimensional accuracy of the pattern. Judging if the photomask is defective or non-defective is made on the basis of whether or not the exposure latitude falls within a prescribed exposure latitude
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申请公布号 |
US6649310(B2) |
申请公布日期 |
2003.11.18 |
申请号 |
US20010940578 |
申请日期 |
2001.08.29 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
ITOH MASAMITSU;NOJIMA SHIGEKI;MIMOTOGI SHOJI;IKENAGA OSAMU |
分类号 |
G03F1/08;G03F1/00;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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