发明名称 Supporting gate contacts over source region on MOSFET devices
摘要 Increasing the number of MOSFET gate bump contacts makes MOSFET gate contacts more durable and reliable. Extension of the under-bump metal laterally from the gate contact with the gate pad metallization out to two or more gate pads overlying the source pad metallization reduces the risk of delamination of the metallization due to thermal and mechanical stresses in assembly and operation. Use of more than one gate pad further reduces such failure risks. The result is a reliable, durable MOSFET gate contact.
申请公布号 US6649961(B2) 申请公布日期 2003.11.18
申请号 US20020117890 申请日期 2002.04.08
申请人 FAIRCHILD SEMICONDUCTOR CORPORATION 发明人 ESTACIO MARIA CRISTINA B.;BENDAL R. EVAN
分类号 H01L21/60;H01L23/482;H01L23/485;(IPC1-7):H01L29/72 主分类号 H01L21/60
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