发明名称 Vertical power devices having trench-based electrodes therein
摘要 Vertical power devices include a semiconductor substrate having a drift region of first conductivity type therein and first and second stripe-shaped trenches that extend in the semiconductor substrate and define a drift region mesa therebetween. First and second insulated source electrodes are provided in the first and second stripe-shaped trenches, respectively. A UMOSFET, comprising a third trench that is shallower than the first and second stripe-shaped trenches, is provided in the drift region mesa.
申请公布号 US6649975(B2) 申请公布日期 2003.11.18
申请号 US20010992104 申请日期 2001.11.05
申请人 SILICON SEMICONDUCTOR CORPORATION 发明人 BALIGA BANTVAL JAYANT
分类号 H01L21/336;H01L23/552;H01L23/60;H01L23/66;H01L27/088;H01L29/06;H01L29/40;H01L29/417;H01L29/423;H01L29/78;(IPC1-7):H01L29/94;H01L29/96 主分类号 H01L21/336
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