| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To polish a metal substrate at a sufficiently high polishing speed and high polishing accuracy even when an oxidizer is not blended in an abrasive. <P>SOLUTION: Hydrogen peroxide, peracetic acid, urea-hydrogen peroxide, urea peroxide, peroxotitanic acid, and their mixtures are suitably used as components having oxidation performance, and especially the peroxotitanic acid and its mixture are preferable. The content of these components having the oxidation ability is preferably in a range of 0.1 to 20 wt.%. When the content is less than 0.1 wt.%, the oxidation ability is reduced and a sufficiently high polishing speed can not be obtained, and when the content exceeds 20 wt.%, the adsorption and carrying of these components by inorganic oxide grains become difficult, or some components out of these components may be separated from the polishing grains into a dispersion medium in the abrasive. <P>COPYRIGHT: (C)2004,JPO</p> |
