发明名称 FILM OF FINE SEMICONDUCTOR PARTICLE, PHOTOELECTRIC CONVERSION ELEMENT AND PHOTOELECTRIC CELL
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a fine semiconductor particle film useful for photoelectric conversion element and the like, a method for manufacturing a dye-sensitized photoelectric conversion element showing excellent conversion efficiency, the photoelectric conversion element produced by this method, and a photocell using this photoelectric conversion element. <P>SOLUTION: The method for manufacturing the fine semiconductor particle film comprises the step of forming a metal oxide layer by cathordicelectrodeposition on a porous fine semiconductor particle film with 10 of roughness factor or more. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003323920(A) 申请公布日期 2003.11.14
申请号 JP20030009276 申请日期 2003.01.17
申请人 FUJI PHOTO FILM CO LTD 发明人 WATANABE TETSUYA;YOSHIKAWA SUSUMU
分类号 H01L31/04;H01M14/00 主分类号 H01L31/04
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