| 摘要 |
PROBLEM TO BE SOLVED: To provide a device for supplying a vapor depositing material which is capable of stably supplying the vapor depositing material to an evaporating source unit in the vapor deposition by electron beam heating, and to provide a vapor deposition apparatus. SOLUTION: A device 7 for supplying the vapor depositing material has a tank 14 for storing the vapor depositing material, a ball feeder 41 to which the vapor depositing material is supplied, a vibrator 15a for vibrating the ball feeder 41, and a linear feeder 13 for supplying the vapor depositing material supplied from a vapor depositing material discharge port 43 of the ball feeder 41 to a hearth 8. A spiral groove 42 is provided on the inner sidewall of the ball feeder 41, and the groove 42 reaches the vapor depositing material discharge port 43 from the bottom surface of the ball feeder 41. The vapor depositing material in the ball feeder 41 is transferred to the vapor depositing material discharge port 43 along the spiral groove 42 by the vibration of the vibrator 15a. COPYRIGHT: (C)2004,JPO
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