| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an automatic forming method of a dummy pattern for forming the dummy pattern further effectively by providing two or more kinds of sizes and arrangements of the dummy pattern to be formed automatically. <P>SOLUTION: (S1) Dummy constituents of dummies of a large size and a small size are prepared for providing a part wherein a dummy of a large size and a dummy of a small size overlap each other. (S2) After a dummy forbidden region is formed on the layout data of an actual pattern, the prepared dummy constituents are arranged all over the data. (S3) An operation to dummy forbidden region is carried out in the dummy of a large size, and the dummy having an overlapping region is erased. (S4) An operation to the dummy forbidden region is carried out in the dummy of a small size, and the dummy having an overlapping region is erased. (S5) The dummy of a small size overlapping the dummy of a large size which is already formed is erased. <P>COPYRIGHT: (C)2004,JPO</p> |
