| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a polishing technology capable of suppressing the occurrence of scratching, peeling, dishing, and erosion and suppressing the costs of expendables such as abrasive and polishing cloth without requiring a complicated cleaning process or an abrasive supplying/processing device. <P>SOLUTION: A metallic film 21 formed on the surface of an insulating film 23 having grooves is polished by a polishing solution containing substances capable of dissolving oxidizing substances and oxides into water and not containing grinding grains. <P>COPYRIGHT: (C)2004,JPO</p> |
