| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent dislocation of processing liquid supply nozzles, to smoothly transport the processing liquid supply nozzles, to improve position precision of the processing liquid supply nozzles, and to improve processing precision and a yield. <P>SOLUTION: A substrate processor is provided with a spin chuck 50 which rotatably holds a wafer W, a plurality of the processing liquid supply nozzles 60 supplying processing liquid to a surface of the wafer W, a stand-by holding means 70 holding the nozzles 60 in stand-by positions, and a nozzle transport arm 80 which attachably and detachably grasps one of nozzles 60 held by the stand-by holding means 70 and transports it to an upper part of the wafer W. The nozzles 60 are arranged on straight lines L connecting a rotary center C of the spin chuck 50, and nozzle holding opening parts 71 disposed in the stand-by holding means 70 by leaving appropriate intervals. Supply tubes 61 connecting the nozzles 60 and a processing liquid supply source and having flexibility are disposed along extension lines of the straight lines L. <P>COPYRIGHT: (C)2004,JPO |
