| 摘要 |
PROBLEM TO BE SOLVED: To provide a shadow frame which is particularly useful in plasma enhanced chemical vapor deposition (PECVD) applications used to make active matrix liquid crystal displays (AMLCDs) and solar cells. SOLUTION: A shadow frame and framing system for semiconductor fabrication equipment comprises a rectangular frame having four edges, the edges forming an interior lip with a top surface and a bottom engagement surface; and a cross beam disposed between at least two edges of the frame, the cross beam having a top surface and a bottom engagement surface, the engagement surface of the cross beam configured to be flush with the engagement surface of the lip; wherein one or more of the engagement surfaces are configured to cover metal interconnect bonding areas on a carrier disposed below the frame. COPYRIGHT: (C)2004,JPO
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