| 摘要 |
PURPOSE: A wafer dryer and a method for drying a wafer are provided to be capable of easily carrying out a drying process at the wafer while solving the problems caused by a spin drying method or an IPA(IsoPropyl Alcohol) drying method. CONSTITUTION: A wafer dryer is provided with a chamber(10) having a rinsing zone(100) and a drying zone(200), a deionized water supplying unit(11) for supplying deionized water to the rinsing zone of the chamber, and a deionized water exhausting unit(12) for exhausting the deionized water from the rinsing zone. The wafer dryer further includes a wafer carrier(13) installed in the chamber for moving a wafer between the rinsing zone and the drying zone, a vacuum pump(20) connected to the drying zone for decreasing the pressure of the drying zone, and a heater(30) for heating the drying zone.
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