| 摘要 |
PURPOSE: A photosensitive polymer having homogeneously distributed hydrophobic units and hydrophilic units is provided to obtain a resist composition having excellent adhesion and resolution, and to reduce the bridging defects, peeling and swelling in a photolithographic process. CONSTITUTION: The photosensitive polymer comprises the structure of the following formula, wherein each of R1 and R2 is hydrogen atom or methyl group, R3 is an acid-liable hydrocarbon radical, R4 is a hydrophilic group, a/(a+b+c+d+e) is 0.01-0.6, b/(a+b+c+d+e) is 0.05-0.7, c/(a+b+c+d+e) is 0.01-0.6, d/(a+b+c+d+e) is 0.1-0.5 and e/(a+b+c+d+e) is 0.01-0.5. The photosensitive polymer has the weight average molecular weight of 3000-100,000. In particular, the R4 group is selected from the group consisting of hydroxyl, carboxyl, ether, lactone and hyperlactone.
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