发明名称 PHASE GRATING MASK AND METHOD AND APPARATUS FOR MANUFACTURING OPTICAL WAVEGUIDE TYPE DIFFRACTION GRATING ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method, etc., for manufacturing optical waveguide type diffraction grating element having desired optical characteristics even if the machining accuracy of a phase grating mask is inferior. SOLUTION: An apparatus for manufacturing optical waveguide type diffraction grating element is equipped with the phase grating mask 210, a light source 310, and a mirror 320 and further equipped with a means for arranging and holding the phase grating mask 21 and an optical fiber 110 at specified positions respectively. The phase grating mask 210 is a flat plate made of quartz glass and has a phase grating which is cyclically uneven on one surface (grating surface) 211 of the flat plate, and the other surface (incident surface) 212 is left flat. On the incident surface 212 of the phase grating mask 210, an antireflective film 213 is provided which reduces reflection of refractive index change inducing light A. The antireflective film 213 reduces the reflection of the refractive index change including light A which is reflected by the grating surface 211 and made incident on the incident surface 212. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003322732(A) 申请公布日期 2003.11.14
申请号 JP20020128693 申请日期 2002.04.30
申请人 SUMITOMO ELECTRIC IND LTD 发明人 SHIBATA TOSHIKAZU;INOUE SUSUMU;HASHIMOTO TAKESHI;MURASHIMA KIYOTAKA
分类号 G02B5/18;G02B6/02;G02B6/10;(IPC1-7):G02B6/10;G02B6/16 主分类号 G02B5/18
代理机构 代理人
主权项
地址