PHOTOMASK, METHOD FOR MAKING UP THE SAME AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To simultaneously increase the fineness of an isolated space pattern and the fineness of an isolated line pattern or the fineness of a dense pattern.

SOLUTION: A phase shifting film 11 which transmits exposure light at a low transmittance after phase inversion is formed on the upper region of a transparent substrate 10 except a light transmissive portion forming region (opening forming region). The opening forming region and its peripheral part in the transparent substrate 10 are hollowed out by such a thickness as to cause phase inversion to exposure light to form a light transmissive portion (opening). The peripheral part of the opening in the phase shifting film 11 is overhang.

COPYRIGHT: (C)2004,JPO