| 发明名称 |
SILVER HALIDE PHOTOSENSITIVE MATERIAL |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a stably manufacturable silver halide photosensitive material excellent in antistatic performance. SOLUTION: The silver halide photosensitive material has at least one photosensitive silver halide emulsion layer on a support and contains at least one of the compounds represented by the formula R<SP>1</SP>-Z<SP>1</SP>and a fluorine-containing surfactant in at least one layer, wherein R<SP>1</SP>is a 6-24C unsubstituted or hydroxy substituted alkyl or a 6-24C unsubstituted alkenyl; Z<SP>1</SP>is OSO<SB>3</SB>M or SO<SB>3</SB>M; and M is a cation. COPYRIGHT: (C)2004,JPO
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| 申请公布号 |
JP2003322926(A) |
申请公布日期 |
2003.11.14 |
| 申请号 |
JP20020130800 |
申请日期 |
2002.05.02 |
| 申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
TSUKADA YOSHIHISA;YANAGI TERUKAZU;YOKOTA KOICHI |
| 分类号 |
G03C1/76;G03C1/38;(IPC1-7):G03C1/76 |
主分类号 |
G03C1/76 |
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