发明名称 Apparatus, system and method to reduce wafer warpage
摘要 Typically, the frontside of a wafer is protected by a tape during backgrinding. Electrostatic charge may accumulate on the tape during the backgrinding operation. The wafer may warp after the backgrinding operation because the thinned wafer is not sufficiently rigid to counteract the bending forces resulting from the accumulation of electrostatic charge. In order to reduce wafer warpage, ionized air may be directed onto the wafer and tape to reduce the accumulation of electrostatic charge.
申请公布号 US2003209310(A1) 申请公布日期 2003.11.13
申请号 US20020145171 申请日期 2002.05.13
申请人 FUENTES ANASTACIO C.;ATIENZA REYNALDO S.;CLAVIO CHESALON M. 发明人 FUENTES ANASTACIO C.;ATIENZA REYNALDO S.;CLAVIO CHESALON M.
分类号 B24B37/04;H01L21/00;H01L21/302;H01L21/306;(IPC1-7):B32B31/00 主分类号 B24B37/04
代理机构 代理人
主权项
地址