发明名称 Verfahren zum Aufladen der Oberfläche eines elektrisch nicht leitenden schichtförmigen Materials und Vorrichtung zur Durchführung des Verfahrens
摘要 This invention relates to a process and apparatus for increasing the charge density on the surface of a dielectric material in which electrons and gas ions are produced in the gas space above the surface of the material by means of direct current so that the surface is electrostatically charged. The process is an improvement which comprises producing an electric field of the same polarity above the source which generates the electrons and gas ions, whereby the migration of the electrons and gas ions to the surface of the material is directed.
申请公布号 CH519979(A) 申请公布日期 1972.03.15
申请号 CH19700018477 申请日期 1970.12.14
申请人 KALLE AKTIENGESELLSCHAFT 发明人 HAAS,GUENTER,DIPL.-ING.
分类号 H05F3/00;B29C47/88;B29C55/02;B29C71/00;B29D7/00;H05F3/04 主分类号 H05F3/00
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