发明名称 |
CAPILLARY DRYING OF SUBSTRATES |
摘要 |
An apparatus and method for drying substrates. The inventive apparatus comprises: an object support member for supporting at least one substrate in a process tank having one or more support sections comprising capillary material. The inventive method is a method of removing liquid from a wet substrate in a process tank comprising contacting the wet substrate with capillary material. In another aspect, the invention is a method of drying at least one substrate having a surface in a process tank comprising: submerging the substrate in a liquid having a liquid level; supporting the submerged substrates in the process tank; supplying a drying vapor above the liquid level; lowering the liquid level or raising the substrate so that the liquid level is below the substrate, thereby removing a major portion of liquid from the substrate surface; and removing remaining liquid from the substrate surface with capillary material.
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申请公布号 |
WO03066246(B1) |
申请公布日期 |
2003.11.13 |
申请号 |
WO2003US03561 |
申请日期 |
2003.02.05 |
申请人 |
AKRION, LLC;MYLAND, LAWRENCE, J. |
发明人 |
MYLAND, LAWRENCE, J. |
分类号 |
F26B5/16;H01L21/00;H01L21/304;H01L21/306;H01L21/673;(IPC1-7):B08B7/00 |
主分类号 |
F26B5/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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