发明名称 Semiconductor component with an increased breakdown voltage in the edge area
摘要 A semiconductor component has a cell array formed in a semiconductor body with a number of identical transistor cells and at least one edge cell formed at an edge of the cell array. Each of the transistor cells has a control electrode, which is formed in a trench, and the edge cell has a field plate, which is formed in a trench, with a distance between the trench of the edge cell and the trench of the immediately adjacent transistor cell being less than the distance between a trench of a transistor cell and the trench of an immediately adjacent transistor cell in the cell array.
申请公布号 US2003209757(A1) 申请公布日期 2003.11.13
申请号 US20030402872 申请日期 2003.03.28
申请人 HENNINGER RALF;HIRLER FRANZ;KRUMREY JOACHIM;ZUNDEL MARKUS;RIEGER WALTER;POLZL MARTIN 发明人 HENNINGER RALF;HIRLER FRANZ;KRUMREY JOACHIM;ZUNDEL MARKUS;RIEGER WALTER;POLZL MARTIN
分类号 H01L29/06;H01L29/40;H01L29/423;H01L29/78;(IPC1-7):H01L29/76 主分类号 H01L29/06
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