发明名称 Contact structure
摘要 There is disclosed a contact structure for electrically connecting conducting lines formed on a first substrate of an electrooptical device such as a liquid crystal display with conducting lines formed on a second substrate via conducting spacers while assuring a uniform cell gap among different cells if the interlayer dielectric film thickness is nonuniform across the cell or among different cells. A first conducting film and a dielectric film are deposited on the first substrate. Openings are formed in the dielectric film. A second conducting film covers the dielectric film left and the openings. The conducting spacers electrically connect the second conducting film over the first substrate with a third conducting film on the second substrate. The cell gap depends only on the size of the spacers, which maintain the cell gap.
申请公布号 US2003210357(A1) 申请公布日期 2003.11.13
申请号 US20030453684 申请日期 2003.06.04
申请人 发明人 HIRAKATA YOSHIHARU;YAMAZAKI SHUNPEI
分类号 G02F1/1339;G02F1/1345;G09F9/30;H01L21/336;H01L29/786;(IPC1-7):G02F1/136 主分类号 G02F1/1339
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