APPARATUS AND METHOD FOR PREVENTING DROPLETS ON WAFERS DURING SOLVENT DRYING PROCESS

摘要

An apparatus and a method for preventing solvent droplets from falling on wafers during a solvent drying process of a semiconductor wafer. The apparatus is constructed by a body having a cavity therein for holding a wafer, means for introducing a solvent vapor in the cavity, a plurality of condenser coils on an inside wall of the cavity, and a plurality of condensing plates attached to the plurality of condenser coils on a surface facing the wafer for condensing solvent vapor and flowing condensed solvent into a reservoir thus preventing solvent droplets from falling on the wafer surface.