METHOD OF TESTING SEMICONDUCTOR DEVICE

摘要

A method of testing a semiconductor device is provided. In a SEM image comparison type testing apparatus, a comparison is made between the voltage contrast of a predetermined pattern to be tested and the voltage contrast of a reference pattern to produce a comparison image containing only one of two binary contrast levels. A dimension based on contrast regions in the comparison image is measured, and a characterizing dimension varying depending on the process of manufacture of the semiconductor device is analyzed from the result of measurement.