发明名称 PLASMA DEVICE AND PLASMA GENERATING METHOD
摘要 A plasma device includes a slot antenna (30) for supplying a high frequency electromagnetic field (F) supplied through a feeding part into a processing vessel (11). The feeding part has a cavity (35) for forming a resonator and converting the fed high frequency electromagnetic field (F) into a rotating electromagnetic field and supplying the rotating electromagnetic field to the slot antenna (30). <IMAGE>
申请公布号 EP1361782(A1) 申请公布日期 2003.11.12
申请号 EP20020715809 申请日期 2002.01.18
申请人 TOKYO ELECTRON LIMITED;ANDO, MAKOTO;TAKAHASHI, MASAHARU 发明人 ANDO, MAKOTO;TAKAHASHI, MASAHARU;ISHII, NOBUO
分类号 H01J37/32;H05H1/46;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H05H1/46;H01L21/306 主分类号 H01J37/32
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