A new structure and method is provided for the creation of an inductor on the surface of a silicon semiconductor substrate. The inductor is of a helix coil design having upper level and lower level conductors further having an axis whereby the axis of the helix coil of the inductor is parallel to the plane of the underlying substrate. Under the first embodiment of the invention, the height of the helix coil that is created on the surface of a silicon substrate is uniform. Under the second embodiment of the invention the height of the helix coil of the inductor of the invention is uniform while a ferromagnetic core is inserted between the upper and the lower level conductors of the helix coil. Under the third embodiment of the invention, the height of the helix coil that is created on the surface of a silicon substrate is non-uniform. Under the fourth embodiment of the invention the height of the helix coil of the inductor of the invention is non-uniform while a ferromagnetic core is inserted between the upper and the lower level conductors of the helix coil. <IMAGE>
申请公布号
EP1132965(A3)
申请公布日期
2003.11.12
申请号
EP20010480021
申请日期
2001.03.05
申请人
CHARTERED SEMICONDUCTOR MANUFACTURING PTE LTD.
发明人
SENG, YEOW KIAT;TAN, HAI PENG;MA, JIAN GUO;ANH, MANH;CHEW, KOK WAI