发明名称 Control of a lithographic apparatus
摘要 A controller system for a pulsed radiation source is a closed-loop controller of minimum order, preferably first, to effect dead beat control. Performance indicators for a pulsed radiation source in a lithographic apparatus are based on Moving Averages, MA, and Moving Standard Deviations, MSD, of the error between target and actual pulse energies. The normalized indicators are given by: <MATH> where Epref(i) and Eperr(i) indicate reference energy per pulse and energy error per pulse for point i. and: <MATH> <IMAGE>
申请公布号 EP1361479(A1) 申请公布日期 2003.11.12
申请号 EP20030252890 申请日期 2003.05.08
申请人 ASML NETHERLANDS B.V. 发明人 HEINTZE, JOHANNES
分类号 G03F7/20;H01S3/134;H01S3/225 主分类号 G03F7/20
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