Method for manufacturing a pair of complementary masks

摘要

A method for manufacturing a pair of complementary masks for use in an electron projection lithographic (EPL) technique uses an algorithm for distributing the design data to a pair of EPL masks. The algorithm allocates a positive sign or negative sign to each of the pattern data, summation of the areas of the pattern data having positive signs while subtracting the areas of the pattern data having negative signs, for obtaining a minimum of the sum. One or more of initial combination of the signs is prepared and the vicinity of the initial combination is calculated therefrom for obtaining an optimum combination.