发明名称 |
Method of operating a processing chamber having multiple stations |
摘要 |
A method for operating a multi-station processing chamber is described. A wafer is loaded onto the first station then indexed to the second station prior to processing. The indexing causes the wafer to be well-seated on it spindle before being processed. This prevents an improperly seated wafer from being processed at the first station.
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申请公布号 |
US6645877(B2) |
申请公布日期 |
2003.11.11 |
申请号 |
US20020059903 |
申请日期 |
2002.01.28 |
申请人 |
INTEL CORPORATION |
发明人 |
OTT ANDREW;O'LOUGHLIN JENNIFER L. |
分类号 |
C23C16/54;C30B25/02;H01L21/00;(IPC1-7):H01L21/31 |
主分类号 |
C23C16/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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