发明名称 Method of and apparatus for forming three-dimensional structures integral with semiconductor based circuitry
摘要 Enhanced Electrochemical fabrication processes are provided that can form three-dimensional multi-layer structures using semiconductor based circuitry as a substrate. Electrically functional portions of the structure are formed from structural material (e.g. nickel) that adheres to contact pads of the circuit. Aluminum contact pads and silicon structures are protected from copper diffusion damage by application of appropriate barrier layers.
申请公布号 AU2003228977(A8) 申请公布日期 2003.11.11
申请号 AU20030228977 申请日期 2003.05.07
申请人 UNIVERSITY OF SOUTHERN CALIFORNIA 发明人 ADAM L. COHEN
分类号 B81C1/00;C25D1/00;C25D5/02;H01L21/288;H01L21/60;H01L21/768;H01L23/485 主分类号 B81C1/00
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