发明名称 |
Method of and apparatus for forming three-dimensional structures integral with semiconductor based circuitry |
摘要 |
Enhanced Electrochemical fabrication processes are provided that can form three-dimensional multi-layer structures using semiconductor based circuitry as a substrate. Electrically functional portions of the structure are formed from structural material (e.g. nickel) that adheres to contact pads of the circuit. Aluminum contact pads and silicon structures are protected from copper diffusion damage by application of appropriate barrier layers. |
申请公布号 |
AU2003228977(A8) |
申请公布日期 |
2003.11.11 |
申请号 |
AU20030228977 |
申请日期 |
2003.05.07 |
申请人 |
UNIVERSITY OF SOUTHERN CALIFORNIA |
发明人 |
ADAM L. COHEN |
分类号 |
B81C1/00;C25D1/00;C25D5/02;H01L21/288;H01L21/60;H01L21/768;H01L23/485 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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