发明名称 Mesh shield in a sputter reactor
摘要 A sputtering shield for use in a plasma sputter reactor and formed of one or more layers of mesh bent into a desired shield shape is disclosed. The multiple layers are arranged to minimize overlap of mesh apertures to thereby decrease line-of-sight holes through the mesh assembly. A foil may be placed between the outermost two mesh layers to further increase opacity. The mesh may be fixed to solid metal parts, such as flanges, grommets, hemming, or complex parts of the overall shield. The mesh shield provides better adhesion of sputter coated layers, thereby allowing longer use before replacement, and is less expensive to fabricate so that it can be treated as a consumable.
申请公布号 US6645357(B2) 申请公布日期 2003.11.11
申请号 US20010015200 申请日期 2001.11.05
申请人 APPLIED MATERIALS, INC. 发明人 POWELL EARL G.
分类号 C23C14/34;C23C14/56;H01J37/34;(IPC1-7):C23C14/00 主分类号 C23C14/34
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