发明名称 Manufacturing method and manufacturing device of microstructure
摘要 Provided is a manufacturing method and manufacturing device of a microstructure capable of forming resin patterns on a substrate without any "offset portion". A substrate 50 and a stamper 30 to which a concave/convex pattern is formed are aligned so as to be flush; resin 60 is infiltrated from one end side of the stamper 30 to the aligned face of the substrate 50 and stamper 30, and the resin 60 is drawn into the concave/convex pattern of the stamper 30 by setting the barometric pressure of the other end side of the stamper 30 to be relatively lower than the one end side of the stamper 30; resin 60 that spread in the concave/convex pattern of the stamper 30 is cured; and a resin 60 pattern transferred from the stamper 30 is obtained on the substrate 50 by separating the substrate 50 and stamper 30.
申请公布号 US6645793(B2) 申请公布日期 2003.11.11
申请号 US20010956490 申请日期 2001.09.19
申请人 SEIKO EPSON CORPORATION 发明人 FUJII EIICHI;NAGASAKA KIMIO
分类号 B29C39/26;B29C39/10;B29C39/24;B29C39/42;B81C1/00;G03F7/00;G11B7/26;(IPC1-7):H01L21/44 主分类号 B29C39/26
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