首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
Photoresist composition
摘要
Disclosed are new photoresist compositions including polymeric particles as binders and a photoactive component. Also disclosed are methods of forming relief images using these photoresist compositions.
申请公布号
US6645695(B2)
申请公布日期
2003.11.11
申请号
US20010948528
申请日期
2001.09.07
申请人
SHIPLEY COMPANY, L.L.C.
发明人
ZAMPINI ANTHONY
分类号
G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03F7/004
主分类号
G03F7/004
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Spring tip needle combination
Flame-retardant polyketone resin composition and molded article
Time sequential lookup table arrangement for a display
Bipolar separator plate with improved wet seals
Simplified process for forming thin film transistor matrix for liquid crystal display
Method and apparatus for applying a colorant to a thermoplastic to produce a visual effect
Method for implementing transaction-based billing for telephone services
Displaying images during boot-up and shutdown
Radiation shielding materials and containers incorporating same
Method for nucleic acid transfection of cells
Method of making a TFT array with photo-imageable insulating layer over address lines
Acellular matrix grafts: preparation and use
Electromagnetic vehicle disabler system and method
Keypad for a handset
Handset
Method for generating a footprint image file for an intelligent backup and restoring system
Guidewire for positioning a catheter against a lumen wall
Method and apparatus for storing information in a data processing system
Multi-pair transceiver decoder system with low computation slicer
Beveiliging voor hijsklem voor bouwelementen.
