发明名称 |
Hollow cylindrical cathode sputtering target and process for producing it |
摘要 |
A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
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申请公布号 |
US6645358(B2) |
申请公布日期 |
2003.11.11 |
申请号 |
US20020047343 |
申请日期 |
2002.01.15 |
申请人 |
W.C. HERAEUS GMBH & CO. KG |
发明人 |
LUPTON DAVID;HECK RALF;STENGER BERND;WARKENTIN OLIVER |
分类号 |
C23C14/34;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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