| 摘要 |
The present invention relates to a method and apparatus for plasma deposition of a chemically reactive group (Y-Z) on a substrate, chemically reactive substrates, and use thereof, e.g. for immobilisation of biomolecules; the method comprising: (a) providing at least one precursor (A-X (Y)) for the chemically reactive group; (b) providing at least one donor (D(Z)), said at least one donor comprising at least one addition group (Z), optionally said at least one addition group (Z) being comprised in said precursor (A-X (Y)) and optionally said at least one donor (D(Z)) is not being provided; (c) providing a substrate (M); (d) providing a gas plasma, said gas plasma having a pressure and an energy to form at least one activated carrier group (B); and (e) reacting said substrate (M), said at least one precursor (A-X (Y)), said at least one donor (D(Z)) in said gas plasma so that said chemically reactive group (Y-Z) is bound to said substrate, either directly (M-Y-Z) or via said at least one activated carrier group (M-B-Y-Z), and so that when exposed to a substance which chemically reacts with said chemically reactive group, said substance binds thereto. |
