ILLUMINATION OPTICAL SYSTEM, ILLUMINATION METHOD, AND EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an illumination optical system for obtaining a desired effective light source in response to changes in pattern and relatively displacing each partial effective light source.

SOLUTION: The illumination optical system for illuminating a reticle with a luminous flux from a light source has an effective light source forming means capable of relatively displacing a first area and a second area that differs from the first area within the amount of light distribution in a predetermined area where a Fourier transform relation is substantially formed relative to the reticle.

COPYRIGHT: (C)2004,JPO