APPARATUS OF WARNING OF UNSTRIPING OF PHOTORESIST AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

摘要

PURPOSE: An apparatus of warning of unstriping of photoresist is provided to be capable of previously preventing the generation of residual photoresist. CONSTITUTION: A wafer(20) having photoresist residue is prepared in a chamber(10). A plasma generator produces a plasma(28) in the chamber. A manometer(32) is connected to the chamber(10) for measuring the pressure in the chamber. A computer(30) compares the pressure in the chamber with a reference pressure in reference pressure operating time, wherein the reference pressure operating time is a time when reducing the pressure. If the pressure in the chamber is different from the reference pressure within the reference pressure operating time, a warning part(34) is operated according to the control of the computer(30).